Lieberman, Michael A. Lichtenberg, Allan J.
Principles of plasma discharges and materials processing - New York John Wiley 1994 - xxvi, 572p. : ill.
0471005770
PLASMA PHYSICS
PLASMA CHEMISTRY
THIN FILMS - Surfaces
PLASMA DYNAMICS
533.9 / L5
Principles of plasma discharges and materials processing - New York John Wiley 1994 - xxvi, 572p. : ill.
0471005770
PLASMA PHYSICS
PLASMA CHEMISTRY
THIN FILMS - Surfaces
PLASMA DYNAMICS
533.9 / L5